Argon Fluoride Mixtures (Ar & F2)
Argon Fluoride Mixtures are used in 193nm lithography applications, usually in conjunction with an inert gas mixture.
Major Components |
|
 |
Maximum Impurities |
|
 |
|
|
|
Argon Fluoride Mixtures (Ar & F2)Argon Fluoride Mixtures are used in 193nm lithography applications, usually in conjunction with an inert gas mixture.
|
||||||||||||||||