Nitrogen Trifluoride (NF3)
Nitrogen Trifluoride is used to provide fluoride free radical source for chamber cleaning of semiconductor process chambers.
Threshold Limit Value (TLV) : 10ppm
Physical properties: Oxidising, toxic
Physical Constants |
|
 |
Maximum Impurities for Semiconductor Grade: 99.8% |
|
 |
Maximum Impurities for ULSI Grade: 99.9+% |
|
 |
